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book
 Design for Manufacturability and Yield for Nano-Scale CMOS
In the nano-era of CMOS the design and manufacturing communities are dealing with printing circuit artifacts that are less than half the wavelength of the light source used, with new materials, and with tighter pitch and higher aspect ratio metallurgies.
This reality has resulted in three main manufacturability issues namely printability, planarization, and intra-die variability.
Not addressing the fundamentals causing these three issues at...
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http://www.amazon.com
8/8/2006
Tags: dfm
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